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Reliability

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Summary of reliability results on M/A-COM processes (April 2001)
  

Process
MTTF at Tch= Activation Energy Tch during life tests
150°C 125°C 85°C
SI1 - switch 1 X 107 hrs.
1 X 108 hrs.
7 X 109 hrs.
1.3 eV 200, 225, 250°C
HI2 - amp 3 X 105 hrs.
2 X 106 hrs.
7 X 107 hrs.
1.1 eV 200, 250°C
PE3 - amp 6 X 105 hrs.
3 X 106 hrs.
8 X 107 hrs.
1 eV
(assumed)
225°C
HS - switch 9 X 106 hrs.
8 X 107 hrs.
6 X 109 hrs.
1.3 eV
(assumed)
250°C
HP - power
(preliminary)
1 X 106 hrs.
6 X 106 hrs.
2 X 108 hrs.
1 eV 215, 240°C

iHBT
(Jce=10kA/cm2)

3 X 105 hrs.
1 X 106 hrs.
4 X 106 hrs.
0.9 eV
(n=1.4)
225, 250, 280°C


SI1: 0.5µm gate length, recessed, stepper lithography, ion implanted MESFET process
HI2: 0.5µm gate length, recessed, stepper lithography, ion implanted MESFET process, buried p layer
PE3: 0.5µm gate length, recessed, e-beam T-gate, epitaxial MESFET process
HS/HP: 0.5µm gate length, recessed, stepper lithography, AlGaAs/InGaAs pHEMT process, 3V, 160mA/mm
Switch results based on reversed biased life tests (no drain current)
Amplifier results based on operating biased tests (with drain current)


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